1) Optimum inductiverly coupled plasma etching of fused silica to remove subsurface damage layer - Applied Surface Science - 2015 -
2) Terrace morphology on fused silica surfaces by Ar+ ion bombardment with Mo co-deposition. - Appl.Phys.Lett. - -
3) High-accuracy alignment of the grating pattern along silicon <1 1 2> directions using a short rectangular array. - Journal of Micromechanics and Microengineering. - -
4) Near-field holography enhanced with antireflection coatings-an improved method for fabricating diffraction gratings - Chinese Opt. Lett. - -
5) Investigation on morphology and evolution process of plasma induced pitting damage during the ICP etching of fused silica - Vacuum - -
6) 弯月面涂胶均匀性改进 - 强激光与粒子束 - -
7) Alignment method for fabricating a parallel flat-field grating used in soft x-ray region - Appl.Opt. - -